A U.S. Patent Application for a “Culture Device and Culture Method” was published by Kyoto Seisakusho on April 30th, 2020. The present invention is a culture apparatus comprising: a culture vessel including an internal space containing a culture solution in which a culture target is suspended; a gas supply apparatus supplying a single gas or a mixed gas to the internal space of the culture vessel; and an agitation apparatus agitating the culture solution by changing position and posture of the culture vessel, wherein the agitation apparatus changes the position and posture of the culture vessel to circulate the culture solution in the internal space of the culture vessel… Learn More